TRANSISTOR AND METHOD FOR MANUFACTURING SAME
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United States of America
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Issued Date -
Apr 10, 2025
app pub date -
Jun 7, 2024
filing date -
Jun 7, 2024
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Abstract
A transistor that may include a substrate, a drain layer formed within the substrate at a first side of the substrate. A first well implant having a first implant depth, a second well implant having a second implant depth and a third well implant having a third implant depth. The first well implant, the second well implant and the third well implant formed within the substrate at the second side of the substrate. The second implant depth is greater than the first implant depth and the third implant depth is greater than the second implant depth. A gate formed at the second side of the substrate. The gate overlaps the first well implant by a first distance, the gate overlaps the second well implant by a second distance and the gate overlaps the third well implant by a third distance.
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