METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, RECORDING MEDIUM, SUBSTRATE TRANSFER APPARATUS, AND SUBSTRATE PROCESSING APPARATUS

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250118591A1
SERIAL NO

18893519

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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There is provided a technique that includes: by using a substrate transfer apparatus including a mounting stage on which a substrate is placed and a gripper capable of gripping the substrate placed on the mounting stage between a first portion and a second portion, moving the substrate placed on the mounting stage toward the first portion by using the second portion that pushes the substrate with a first external force; and gripping the substrate placed on the mounting stage with a second external force or a third external force by using the first portion and the second portion.

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Patent Owner(s)

Patent OwnerAddress
KOKUSAI ELECTRIC CORPORATION3-4 KANDA-KAJICHO CHIYODA-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
OHASHI, Naofumi Toyama-shi, JP 148 697

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