SUBSTRATE TRANSFER DEVICE, NOTCH POSITION CORRECTION METHOD, SUBSTRATE TRANSFER METHOD, AND STORAGE MEDIUM
Number of patents in Portfolio can not be more than 2000
United States of America
Stats
-
N/A
Issued Date -
Apr 10, 2025
app pub date -
Oct 3, 2024
filing date -
Oct 3, 2024
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
Examples of a substrate transfer device includes a load lock chamber (LLC), a first wafer handling chamber (WHC), a first transfer robot fixed at a first attachment position in the first WHC, a pass through chamber (PTC) that is in contact with the first WHC, a substrate stage provided in the PTC, a second WHC that is in contact with the PTC, and a second transfer robot fixed at a second attachment position in the second WHC. A first angle that is an angle formed by a first virtual line that connects the first attachment position and the second attachment position and a second virtual line that connects the first attachment position and the substrate stage is equal to a second angle that is an angle formed by the first virtual line and a third virtual line that connects the second attachment position and the substrate stage.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully