2D Material Stack Formation

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250118553A1
SERIAL NO

18904750

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Abstract

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A method for forming a stack including: a) providing: a flat surface, a first set of walls, comprising a first wall and a second wall, and meeting at a corner to form an angle, and a first layer formed of a two-dimensional material in physical contact with the flat surface and with both the first and second walls at the corner, wherein the angle aligns with the crystal structure of the two-dimensional material with a tolerance of up to 5°, wherein a top surface of the first layer is exposed, wherein each of the walls has a length of from 5 nm to 1000 nm, wherein a height of the walls, thereby forming a cavity delimited at least by the top surface and the first set of walls, then b) forming a second layer in the cavity and in physical contact with the exposed top surface of the first layer.

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Patent Owner(s)

Patent OwnerAddress
IMEC VZWKAPELDREEF 75 LEUVEN 3001

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Groven, Benjamin Leuven, BE 4 0
Morin, Pierre Woluwe-Saint-Pierre, BE 42 48
Voronenkov, Vladislav Leuven, BE 3 0

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