PLASMA PROCESSING APPARATUS AND HEATING APPARATUS
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United States of America
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Issued Date -
Apr 10, 2025
app pub date -
Jun 21, 2022
filing date -
Jun 21, 2022
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Abstract
In a plasma processing apparatus using a circularly polarized wave, in order to reduce an influence caused by a reflected wave and to efficiently utilize a circularly polarized wave for a plasma process, the plasma processing apparatus includes a microwave source configured to generate a microwave, a plasma processing chamber configured to process a processing target disposed therein by using plasma generated by the microwave, and a waveguide portion that includes a rectangular waveguide connected to the microwave source and a circular waveguide connected to the plasma processing chamber, and the plasma processing apparatus is further provided with, inside the circular waveguide, a reflected wave generator configured to generate a reflected wave that cancels a reflected wave propagating in the circular waveguide from a plasma processing chamber side in a state where the plasma is generated inside the plasma processing chamber by the microwave.
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