MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS

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United States of America

APP PUB NO 20250118529A1
SERIAL NO

18890971

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Abstract

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In one embodiment, a multi-beam writing method is for dividing a writing region of a substrate into multiple stripe regions, and writing each stripe region with a predetermined within-stripe multiplicity of N, where N is an integer greater than 1. The multi-beam writing method includes generating M different types of segments that define a shot order for multiple pixels belonging to each of multiple cells into which the stripe region is divided, the M being an integer greater than 1, irradiating the multiple pixels in the cell with a first individual beam using (m−1)th segment, where m is an integer such that 2≤m≤M, then irradiating the multiple pixels in the cell with a second individual beam different from the first individual beam using mth segment, and writing all pixels in each cell with the multiplicity of N by repeating irradiation sequentially using the M types of segments.

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Patent Owner(s)

Patent OwnerAddress
NUFLARE TECHNOLOGY INCKANAGAWA KANAGAWA

International Classification(s)

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  • 2024 Application Filing Year
  • H01J Class
  • 1150 Applications Filed
  • 64 Patents Issued To-Date
  • 5.57 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances202420250255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
NAKAYAMA, Takahito Chigasaki-shi, JP 60 191
NOMURA, Haruyuki Yokohama-shi, JP 19 12

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges1310101 - 10010020030040050060070080090010001100120013001400

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