ACTIVELY HEATED TARGET TO GENERATE AN ION BEAM

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250118524A1
SERIAL NO

18905177

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Abstract

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An arc chamber for an ion source defines a chamber volume, and a target material is disposed within the chamber volume. The target material comprises a dopant species and can be contained in a target member. An indirectly heated cathode is positioned within the chamber volume and ionizes a source gas within the chamber volume, defining a plasma having a plasma thermal emission. A target heater selectively heats the target material independently from the plasma thermal emission associated with the plasma. The target heater can be a resistive heating element, inductive heating element, halogen heating element, or a laser configured to selectively heat at least a portion of the target member. The target member can consist of a solid dopant material or can contain a liquid dopant material.

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Patent Owner(s)

Patent OwnerAddress
AXCELIS TECHNOLOGIES INC108 CHERRY HILL DRIVE BEVERLY MA 01915

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Abeshaus, Joshua Haverhill, US 7 0
Bassom, Neil J Hamilton, US 32 219
Colvin, Neil K Merrimack, US 27 130

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