LITHOGRAPHY PROCESS
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United States of America
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Issued Date -
Apr 10, 2025
app pub date -
Oct 4, 2023
filing date -
Oct 4, 2023
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Abstract
A lithography method includes the steps which are mentioned below. A photoresist layer is formed over a substrate. The photoresist layer is exposed. The photoresist layer is developed. A vacuum treatment is performed to the photoresist layer. The substrate is etched by using the photoresist layer as an etch mask.
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