SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM
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United States of America
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Issued Date -
Apr 10, 2025
app pub date -
Sep 20, 2024
filing date -
Sep 20, 2024
priority date (Note) -
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Abstract
There is provided a technique that includes: a process container; an exhaust pipe connected to the process container; an opening/closing valve installed at the exhaust pipe; a pressure regulating valve installed at the exhaust pipe; a first supply system supplying one of a cleaning gas and an additive gas, having a molecular structure different from that of the cleaning gas, into the exhaust pipe through a gas supply pipe connected to an upstream of at least one of the opening/closing and pressure regulating valves; a second supply system supplying the other of the cleaning gas and the additive gas into the process container; and a controller capable of controlling the opening/closing valve, the pressure regulating valve, and the first and second supply systems so as to perform a cleaning process of simultaneously supplying the cleaning gas and the additive gas while the opening/closing and pressure regulating valves are opened.
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