SLURRY COMPOSITION FOR CHEMICAL MECHANICAL METAL POLISHING AND POLISHING METHOD USING THE SAME
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United States of America
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Apr 10, 2025
app pub date -
Jul 12, 2024
filing date -
Jul 12, 2024
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Abstract
A slurry composition for chemical mechanical metal polishing includes a corrosion inhibitor, abrasive particles, an oxidizing agent, and a solvent. The corrosion inhibitor includes a C2 to C30 aliphatic heterocyclic compound including at least one nitrogen atom in the ring and at least one functional group selected from a halogen, an amine group, a cyclic amine group, a nitro group, an amide group, a carboxyl group, a hydroxy group, a thiol group, an alkoxy group, a C10 to C30 alkyl group, or an ester group; or a C2 to C30 aromatic heterocyclic compound including at least one nitrogen atom in the ring and at least one functional group selected from a halogen, an amine group, a cyclic amine group, a nitro group, an amide group, a carboxyl group, a hydroxy group, a thiol group, an alkoxy group, a C10 to C30 alkyl group, and an ester group; or a combination thereof.
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