EUV RADIATION GENERATION FOLLOWING LASER BEAM ROTATION
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United States of America
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Issued Date -
Apr 3, 2025
app pub date -
Nov 27, 2024
filing date -
Nov 27, 2024
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Abstract
A device for generating extreme ultraviolet (EUV) radiation includes an optical beam-forming arrangement with a focusing unit for forming a laser beam, and a target material configured to be irradiated with the laser beam to emit EUV radiation. The beam-forming arrangement includes a beam rotator for image field rotation of the laser beam.
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