ABERRATION CORRECTION SYSTEMS AND CHARGED PARTICLE MICROSCOPE SYSTEMS INCLUDING THE SAME
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United States of America
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Issued Date -
Apr 3, 2025
app pub date -
Sep 29, 2023
filing date -
Sep 29, 2023
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Abstract
Aberration correction systems and charged particle microscope systems including the same. An apparatus can include a charged particle source and an optical column. The optical column can include a multipole condenser with one or more condenser quadrupole-generating elements and/or a multipole objective with a plurality of objective multipole elements. The plurality of objective multipole elements can include at least three quadrupole-generating elements and at least three octupole-generating elements configured to at least partially correct a spherical aberration of a charged particle beam. The optical column can be configured such that the charged particle beam enters the multipole objective with a non-circular beam profile and/or such that the charged particle beam is characterized by a non-circular beam profile through at least a portion of the multipole objective.
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