SUBSTRATE PROCESSING APPARATUS AND MONITORING METHOD
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United States of America
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Issued Date -
Apr 3, 2025
app pub date -
Jan 31, 2023
filing date -
Jan 31, 2023
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Abstract
A substrate processing apparatus includes a chamber, a substrate holder, a nozzle, a camera, and a controller. The substrate holder holds a substrate in the chamber. The nozzle discharges a processing liquid toward the substrate held by the substrate holder. The camera captures an image of an imaging region including the monitoring target in the chamber, and generates captured image data. When the captured image data includes a droplet, the controller monitors the monitoring target using a region obtained by removing at least a part of a droplet region indicating the droplet in the captured image data.
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