SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING UNSATURATED BOND AND CYCLIC STRUCTURE
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United States of America
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Apr 3, 2025
app pub date -
Feb 17, 2023
filing date -
Feb 17, 2023
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Abstract
A silicon-containing resist underlayer film-forming composition for forming a silicon-containing resist underlayer film between a metal-containing resist film and a substrate, the silicon-containing resist underlayer film-forming composition including: a component [A]: a polysiloxane; and a component [C]: a solvent, in which the polysiloxane contains a structural unit derived from a hydrolyzable silane (A) represented by the following Formula (A-1):
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