ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS
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United States of America
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Issued Date -
Apr 3, 2025
app pub date -
Sep 13, 2024
filing date -
Sep 13, 2024
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Abstract
An onium salt containing an aromatic sulfonic acid anion having an alkyl or fluoroalkyl group, iodized aromatic ring, and fluorinated substituent group generates an acid with controlled diffusion. A chemically amplified positive resist composition comprising the onium salt is also provided. The resist composition is capable of forming a pattern.
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