WEIGHT AND/OR LAYER THICKNESS MEASURING EQUIPMENT AND SUBSTRATE PROCESSING SYSTEMS AND METHODS INCLUDING SUCH EQUIPMENT

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250109978A1
SERIAL NO

18898765

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Weight and/or layer thickness measurement systems include: (a) a support base for supporting an object; (b) an oscillator source applying oscillating frequency to the support base; (c) a strain sensor measuring strain induced in the support base by the oscillation; and (d) a phase locked loop module connected to the oscillator source and strain sensor. The oscillating frequency applied to the support base is modified based on phase difference information determined by the phase locked loop module to locate a resonant frequency for the support base and supported object. The resonant frequencies before and after processing are used to determine weight and/or thickness of a layer on the object. Cluster type substrate processing systems may include weight and/or layer thickness measurement systems, e.g., of these types, within a substrate handling chamber and/or in a separate chamber or station engaged with the substrate handling chamber.

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Patent Owner(s)

Patent OwnerAddress
ASM IP HOLDING B VVERSTERKERSTRAAT 8 ALMERE 1322 AP

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Harb, Salam Scottsdale, US 14 136

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