FURNACE TUBE FOR THIN FILM DEPOSITION, THIN FILM DEPOSITION METHOD AND PROCESSING APPARATUS
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United States of America
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Issued Date -
Apr 3, 2025
app pub date -
Nov 24, 2022
filing date -
Nov 24, 2022
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Abstract
A furnace tube for thin film deposition, includes: a process tube; a wafer boat, arranged inside the process tube and provided with multi-layered supporting members along the length direction of the process tube; a gas supply tube, arranged inside the process tube and provided with multi-layered gas supply holes along the length direction of the process tube. Multi-layered exhaust holes are arranged on the sidewall of the process tube along the length direction, wherein the distribution area of the gas supply holes is gradually reduced from top to bottom along the length direction of the sidewall of the process tube, and the distribution area of the exhaust holes is gradually reduced from top to bottom along the length direction of the sidewall of the process tube.
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