CHEMICAL VAPOR DEPOSITION SYSTEM WITH HOT-WALL HYBRID FLOW REACTOR AND REMOVABLE REACTOR FLOOR
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United States of America
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Issued Date -
Apr 3, 2025
app pub date -
Sep 27, 2024
filing date -
Sep 27, 2024
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Abstract
A chemical vapor deposition system includes a reaction chamber and a removable wafer carrier including a wafer carrier body that is configured to support a wafer. The system includes a removable cover plate that supports the wafer carrier body and a susceptor base is disposed below the cover plate that supports the cover plate. The removable cover plate is in a nested arrangement with respect to the susceptor base as a result of first nesting structure of the removable cover plate mating with a second nesting structure of the susceptor base.
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