PREPARATION METHOD FOR TUNGSTEN SULFIDE SOLID LUBRICATING FILM BASED ON HIGH POWER IMPULSE MAGNETRON SPUTTERING
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United States of America
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Apr 3, 2025
app pub date -
Mar 20, 2024
filing date -
Mar 20, 2024
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Abstract
A preparation method for a tungsten sulfide (WS2) solid lubricating film based on high power impulse magnetron sputtering (HiPIMS) is provided. The preparation method includes the following steps: step 1: depositing a metal conductive film on a surface of a WS2 target; step 2: using magnetic field sputtering to remove the metal conductive film in a target sputtering area on the surface of the WS2 target, thereby obtaining a first WS2 target; and step 3: performing the HiPIMS on the first WS2 target to obtain the WS2 solid lubricating film. The preparation method can achieve stable glow discharge of a WS2 target and use the high deposition energy of HiPIMS to prepare the WS2 solid lubricating film with high compactness and excellent wear resistance.
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