GAS BARRIER FILM AND METHOD FOR MANUFACTURING GAS BARRIER FILM
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United States of America
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Apr 3, 2025
app pub date -
Mar 14, 2023
filing date -
Mar 14, 2023
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Abstract
To provide a gas barrier film having a high gas barrier property and a high modulus of surface elasticity and having excellent hygrothermal durability, a gas barrier film having less pinholes in the entire surface and having a high gas barrier property, and manufacturing methods of these. A first gas barrier film includes: a gas barrier layer containing silicon and oxygen, and a region in a thickness direction of the gas barrier layer, the region containing silicon, oxygen, and nitrogen, and having an element ratio of nitrogen of 5 at % or greater, and a thickness dM of the region being 30 nm or greater. A second gas barrier film includes a gas barrier layer containing silicon and oxygen, where, in a case where the gas barrier film having a predetermined size is sectioned into a predetermined number, a proportion of the number of sections having a water vapor transmission rate in a predetermined condition of less than 1.0×10−3 g/m2/day is not less than a predetermined proportion.
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