HIGH DENSITY CAPACITOR AND MANUFACTURING METHOD THEREFOR
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Mar 27, 2025
app pub date -
Sep 23, 2024
filing date -
Sep 23, 2024
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
A high-density capacitor and a method for manufacturing the same are disclosed. The high-density capacitor includes a metal-oxide-semiconductor (MOS) capacitor having a silicon layer with a dopant concentration of at least 1×1020 cm-3; a first dielectric layer formed on above the silicon layer, and a first metal layer formed above the first dielectric layer.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully