SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE, AND METHOD OF OPERATING THE SEMICONDUCTOR DEVICE
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Mar 27, 2025
app pub date -
Feb 29, 2024
filing date -
Feb 29, 2024
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
The present technology relates to a semiconductor device, a method of manufacturing the same, and a method of operating the same. The semiconductor device includes a gate stack including first interlayer insulating layers and word line stack layers alternately stacked, a vertical channel structure extending in a vertical direction in the gate stack, and memory structures interposed between the word line stack layers and the vertical channel structure, each of the word line stack layers includes an even conductive layer, a second interlayer insulating layer, and an odd conductive layer sequentially stacked, and a thickness of any one of the first interlayer insulating layers is greater than a thickness of any one of the second interlayer insulating layers.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully