APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION
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United States of America Patent
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Issued Date -
Mar 27, 2025
app pub date -
Dec 6, 2024
filing date -
Dec 6, 2024
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Abstract
A target droplet source for an extreme ultraviolet (EUV) source includes a droplet generator configured to generate target droplets of a given material. The droplet generator includes a nozzle configured to supply the target droplets in a space enclosed by a chamber. The target droplet source further includes a sleeve disposed in the chamber distal to the nozzle. The sleeve is configured to provide a path for the target droplets in the chamber.
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