HIGH-FREQUENCY PROCESSING DEVICE
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United States of America Patent
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Issued Date -
Mar 27, 2025
app pub date -
Dec 7, 2022
filing date -
Dec 7, 2022
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Abstract
A high-frequency processing device includes a high-frequency power supply, a high-frequency power radiation unit, an impedance adjustment unit, a power detection unit, and a control unit. The high-frequency power supply generates high-frequency power of variable magnitude. The high-frequency power radiation unit emits the high-frequency power toward a target object. The impedance adjustment unit adjusts a load impedance. The power detection unit detects supplied power and reflected power. The control unit calculates a reflectance and a phase difference to obtain the load impedance. The control unit determines whether or not the load impedance falls within a predetermined impedance region corresponding to output power of the high-frequency power supply. The control unit causes the impedance adjustment unit to guide the load impedance to and maintain the load impedance within the predetermined impedance region corresponding to the output power of the high-frequency power supply.
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