PHOTORESIST COMPOSITIONS INCLUDING A SULFONATE GROUP AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME

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United States of America Patent

APP PUB NO 20250102914A1
SERIAL NO

18639380

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Abstract

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Photoresist compositions and methods of manufacturing an integrated circuit device by using said photoresist compositions are described. The photoresist compositions may include a photosensitive polymer, a photoacid generator (PAG), and a solvent, wherein the photosensitive polymer contains a sulfonate group (—SO2O—) bonded with an α-trifluoromethylbenzyl group.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTDGYEONGGI DO SOUTH KOREA GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Im, Honggu Suwon-si, KR 7 0
Moon, Yonghoon Suwon-si, KR 3 0
Park, Jeongju Suwon-si, KR 6 2
Park, Jicheol Suwon-si, KR 6 0
Song, Giyoung Suwon-si, KR 11 7

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