SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

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United States of America Patent

APP PUB NO 20250102907A1
SERIAL NO

18676313

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Abstract

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Disclosed are a semiconductor photoresist composition including an organometallic compound; a vinyl group-containing acid compound; and a solvent, and a method of forming a pattern using the same.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG SDI CO LTD150-20 GONGSE-RO GIHEUNG-GU YONGIN-SI GYEONGGI-DO 17084 17084

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHON, Minki Suwon-si, KR 3 0
KIM, Jimin Suwon-si, KR 57 234
LEE, Minyoung Suwon-si, KR 96 815
LIM, Wanhee Suwon-si, KR 6 0
SAKONG, Jun Suwon-si, KR 6 2
SHIN, Seung-Wook Suwon-si, KR 15 52
WOO, Changsoo Suwon-si, KR 17 13

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