EUV MASK AND PELLICLE ASSEMBLY

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United States of America Patent

APP PUB NO 20250102903A1
SERIAL NO

18373485

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Provided is a pellicle assembly that is sufficiently conductive in cooperation with a photomask that is mounted to the pellicle assembly to protect the pellicle and mask from electro static discharge.

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Patent Owner(s)

Patent OwnerAddress
INTEL CORPORATION2200 MISSION COLLEGE BLVD SANTA CLARA CA 95054

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KIM, Yongbae San Jose, US 7 20

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges7870050100150200250300350400450500550600650700750800850

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