REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK
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United States of America Patent
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Issued Date -
Mar 27, 2025
app pub date -
Sep 4, 2024
filing date -
Sep 4, 2024
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Abstract
An absorption film of a reflective mask blank that is formed on a protection film and can be etched by ion beam etching or methanol etching is patterned by providing an etching prevention film contacted with both of the protection film and the absorption film, and a first hard mask film on the absorption film, and patterning the absorption film by ion beam etching or methanol etching with using a pattern of the first hard mask film as an etching mask.
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