BLUR REDUCTION TECHNIQUES FOR SEMICONDUCTOR INSPECTION
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United States of America Patent
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Issued Date -
Mar 27, 2025
app pub date -
Sep 27, 2023
filing date -
Sep 27, 2023
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Disclosed herein are techniques to reduce blurring in images taken during semiconductor inspection. A stage, which holds a substrate for inspection, can move at a substantially constant speed during inspection to increase throughput. In some techniques, a mirror system can be added to the camera system for reducing blur in images. The mirror system can include a rotating or dithering mirror to translate the linear motion of the stage into a counter rotational motion in the form of deflecting beam angles thereby reducing the motion blur caused by the movement of the stage.
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