STRAIN GAUGE, METHOD FOR PRODUCING STRAIN GAUGE, AND STRAIN SENSOR
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United States of America Patent
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Issued Date -
Mar 27, 2025
app pub date -
Dec 5, 2024
filing date -
Dec 5, 2024
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Abstract
A strain gauge according to an embodiment of the present invention includes a strain gauge having a pattern of a laminate including a strain resistance layer and a protective layer having a portion in contact with the strain resistance layer, the protective layer being electrochemically more noble than the strain resistance layer. Thus, when wet etching is performed to form the pattern of the laminate, the protective layer is not easily etched in the vicinity of the strain resistant layer. This inhibits resist pattern peeling or the like, reducing variations in the amount of undercut.
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