HALIDE-FUNCTIONALIZED CYCLOTRISILAZANES AS PRECURSORS FOR DEPOSITION OF SILICON-CONTAINING FILMS
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Mar 27, 2025
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Jan 25, 2023
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Jan 25, 2023
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Halide-functionalized cyclotrisilazane precursor compounds according to Formulae A and B, and methods using the same, for depositing a silicon-containing film such as silicon oxide, silicon nitride, silicon oxynitride, silicon carbonitride, silicon oxycarbonitride, or carbon-doped silicon oxide via a thermal atomic layer deposition (ALD) or plasma enhanced atomic layer deposition (PEALD) process, and combinations thereof.
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