CHEMICAL MECHANICAL POLISHING DEVICE
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United States of America Patent
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Issued Date -
Mar 27, 2025
app pub date -
Jun 21, 2024
filing date -
Jun 21, 2024
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Abstract
A chemical mechanical polishing device includes a frame providing lower and upper spaces in the frame and including a flat plate portion that separates the lower and upper spaces from each other and has a first hole, a driving roller in the lower space and configured to rotate in place, a cleaning assembly in the upper space and configured to reciprocate in a first horizontal direction parallel to an upper surface of the flat plate portion, and a driver extending from the upper space to the lower space through the first hole of the flat plate portion and having one end connected to a base of the driving roller and the other end opposite to the one end and connected to the cleaning assembly, wherein the cleaning assembly includes brushes arranged apart from each other in the first horizontal direction and nozzles arranged respectively between the brushes.
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