RETICLE CARRIER AND ASSOCIATED METHODS

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250093789A1
SERIAL NO

18968343

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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A reticle carrier described herein is configured to quickly discharge the residual charge on a reticle so as to reduce, minimize, and/or prevent particles in the reticle carrier from being attracted to and/or transferred to the reticle. In particular, the reticle carrier may be configured to provide reduced capacitance between an inner baseplate of the reticle carrier and the reticle. The reduction in capacitance may reduce the resistance-capacitance (RC) time constant for discharging the residual charge on the reticle, which may increase the discharge speed for discharging the residual charge through support pins of the reticle carrier. The increase in discharge speed may reduce the likelihood that an electrostatic force in the reticle carrier may attract particles in the reticle carrier to the reticle. This may reduce pattern defects transferred to substrates that are patterned using the reticle, may increase semiconductor device manufacturing quality and yield, and may reduce scrap and rework of semiconductor devices and/or wafers.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTDHSIN-CHU 300-77

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHANG, Han-Lung Kaohsiung City, TW 59 87
CHEN, Li-Jui Hsinchu City, TW 306 606
CHEN, Yen-Hsun Taipei, TW 23 28
CHEN, Yi-Zhen Hsinchu City, TW 21 29
FU, Tzung-Chi Miaoli City, TW 70 299
YEH, Jhan-Hong Hsinchu City, TW 8 13

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