RESIST UNDER-LAYER FOR USE IN A LITHOGRAPHIC APPARATUS
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United States of America
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Issued Date -
Mar 20, 2025
app pub date -
Dec 20, 2022
filing date -
Dec 20, 2022
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Abstract
A substrate arrangement for use in a lithographic apparatus, the substrate arrangement including: a resist; a photosensitive resist under-layer; and a substrate, wherein an exposure threshold of the resist under-layer is lower than an exposure threshold of the resist. The resist and the resist under-layer may be both photosensitive to EUV radiation.
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