ELECTRODEPOSITED COPPER FOIL WITH A UNIFORM MATTE SURFACE

United States of America

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Mar 20, 2025
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Jul 22, 2024
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Jul 22, 2024

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Abstract

The present invention discloses an electrodeposited copper foil with a uniform matte surface. The electrodeposited copper foil of the present invention has an average thickness (T_Ave) of about 30 μm to about 400 μm; and the matte surface of the present electrodeposited copper foil has a uniformity factor (UF) of 5.5 μm or less.

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Patent Owner(s)

Patent Owner	Address
DUPONT ELECTRONICS INC	974 CENTRE ROAD WILMINGTON DE 19805

International Classification(s)

C25D:PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC ....

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
LIN, SHIH-CHING	HSINCHU, TW	11	4
# of filed Patents : 11 Total Citations : 4
LIN, YA-MEI	HSINCHU, TW	3	5
# of filed Patents : 3 Total Citations : 5

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ELECTRODEPOSITED COPPER FOIL WITH A UNIFORM MATTE SURFACE

Number of patents in Portfolio can not be more than 2000

United States of America

18779551

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18779551

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