SUBSTRATE PROCESSING APPARATUS, CONTROL SYSTEM, AND CONTROL METHOD

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250092524A1
SERIAL NO

18964874

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A substrate processing apparatus includes: a substrate processor including a plurality of end devices and performing substrate processing on a substrate by using the end devices; and a controller controlling the substrate processing in the substrate processor, wherein the controller includes a higher-level control unit and a plurality of control boards that are lower-level control units connected to the higher-level control unit via a network, and the control boards send or receive a control signal to or from the end devices and include a clock generator that performs time measurement, and wherein the controller includes a time deviation corrector that transmits a clock signal for a certain period of time from the higher-level control unit to the control boards and that corrects a deviation in actual operation time caused by the clock generator based on the clock signal from the higher-level control unit, in each of the control boards.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDAKASAKA BIZ TOWER 3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 107-6325

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
SATO, Masatoshi Nirasaki City, JP 157 2729

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