SELECTIVE DEPOSITION OF ORGANIC POLYMER MATERIAL AND DEPOSITION ASSEMBLIES

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250092509A1
SERIAL NO

18889069

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Abstract

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The disclosure relates to methods and processing assemblies for selectively depositing organic polymer material on a first surface of a substrate relative to a second surface of the substrate by a cyclic deposition process is disclosed. The method comprises providing a substrate in a reaction chamber, providing a first vapor-phase organic reactant into the reaction chamber and providing a second vapor-phase organic reactant into the reaction chamber. In the method, the first and second vapor-phase organic reactants form the organic polymer material selectively on the first surface; and the first vapor-phase reactant comprises a cyclic compound comprising at least two primary amine groups.

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Patent Owner(s)

Patent OwnerAddress
ASM IP HOLDING B VVERSTERKERSTRAAT 8 ALMERE 1322 AP

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Alli, Saima Helsinki, FI 1 0
Chandrasekaran, Anirudhan Scottsdale, US 13 4
Dezelah, Charles Helsinki, FI 105 1634
Kachel, Krzysztof Kamil Chandler, US 13 2468
Purohit, Bhagyesh Helsinki, FI 3 0
Shero, Eric James Phoenix, US 85 8602
Tois, Eva E Espoo, FI 40 2593
Tuominen, Marko Helsinki, FI 102 10592
Vandalon, Vincent Heverlee, BE 15 3
Vianna, Adam Phoenix, US 3 0
Zhang, Yi Cheng Scottsdale, US 4 4

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