INDIUM OXIDE NANORODS, METHODS FOR PREPARING AND USING SAME
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United States of America
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Issued Date -
Mar 20, 2025
app pub date -
Oct 16, 2023
filing date -
Oct 16, 2023
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Abstract
Provided herein is a method for preparing indium oxide nanorods, comprising the following steps: S1: placing indium oxide powder at a central temperature control area of a tube furnace, and then placing a cleaned silicon wafer downstream from the indium oxide powder; S2: evacuating inside the tube furnace, and then continuing to introduce argon gas; and S3: adjusting a program to heat up the central temperature control area of the tube furnace and maintaining it at a temperature, and then naturally cooling to obtain a indium oxide nanorods grown on the surface of the silicon wafer.
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