Importance

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Abstract

The present disclosure relates to a substrate treatment apparatus having a heating part, including: a chuck base disposed rotatable around a rotational axis and having a ring-shaped spin chuck with chuck pins disposed on top thereof to support a substrate and a chuck support part located on the lower portion of the inner peripheral surface of the spin chuck; a back nozzle assembly mounted through a hollow portion formed at the center of the chuck base to spray a treatment liquid onto the underside of the substrate; cover glass disposed between top of the spin chuck and the back nozzle assembly, when viewed in plan view, and having a through hole formed at the center thereof to pass the back nozzle assembly therethrough; and the heating part disposed inside the spin chuck in a space between the cover glass and the chuck support part, wherein when viewed in plan view, the cover glass has a slant refracting surface formed with a given width around the through hole, and when viewed on a front section, the slant refracting surface is slant upward from top of the cover glass in a radial direction with respect to the rotational axis.

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First Claim