SUBSTRATE TREATMENT APPARATUS HAVING HEATING PART
Number of patents in Portfolio can not be more than 2000
United States of America
Stats
-
N/A
Issued Date -
Mar 20, 2025
app pub date -
Jan 26, 2024
filing date -
Jan 26, 2024
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
The present disclosure relates to a substrate treatment apparatus having a heating part, including: a chuck base disposed rotatable around a rotational axis and having a ring-shaped spin chuck with chuck pins disposed on top thereof to support a substrate and a chuck support part located on the lower portion of the inner peripheral surface of the spin chuck; a back nozzle assembly mounted through a hollow portion formed at the center of the chuck base to spray a treatment liquid onto the underside of the substrate; cover glass disposed between top of the spin chuck and the back nozzle assembly, when viewed in plan view, and having a through hole formed at the center thereof to pass the back nozzle assembly therethrough; and the heating part disposed inside the spin chuck in a space between the cover glass and the chuck support part, wherein when viewed in plan view, the cover glass has a slant refracting surface formed with a given width around the through hole, and when viewed on a front section, the slant refracting surface is slant upward from top of the cover glass in a radial direction with respect to the rotational axis.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully