WOUND TREATMENT APPARATUSES AND METHODS WITH NEGATIVE PRESSURE SOURCE INTEGRATED INTO WOUND DRESSING

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250090382A1
SERIAL NO

18902471

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

Disclosed embodiments relate to apparatuses and methods for wound treatment. In some embodiments, a negative pressure source is incorporated into a wound dressing apparatus so that the wound dressing and the negative pressure source are part of an integral or integrated wound dressing structure that applies the wound dressing and the negative pressure source simultaneously to a patient's wound. The negative pressure source and/or electronic components may be positioned between a wound contact layer and a cover layer of the wound dressing. The negative pressure source and/or electronic components may be separated and/or partitioned from an absorbent area of the dressing. A switch may be integrated with the wound dressing to control operation of the wound dressing apparatus. A connector may be direct air from an outlet of the negative pressure source to the environment. A non-return valve may inhibit back flow of air into the wound dressing. A component may be used to prevent wound exudate from contacting the inlet of the negative pressure source.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
SMITH & NEPHEWHULL

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Askem, Ben Alan Leeds, GB 86 1995
Beadle, Victoria Hull, GB 23 571
Gowans, John Philip Hessle, GB 23 360
Hesketh, Mark Royston, GB 20 264
Hunt, Allan Kenneth Frazer Grugeon Beverley, GB 111 1057
Kelbie, William Inverness, GB 46 432
Musgrave, Damyn Cottenham, GB 36 259
Robinson, Joseph William Papworth Everard, GB 26 422

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation