EXPOSURE MASK, SEMICONDUCTOR DEVICE USING THE EXPOSURE MASK, AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE
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United States of America
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Issued Date -
Mar 13, 2025
app pub date -
Feb 26, 2024
filing date -
Feb 26, 2024
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Abstract
An exposure mask for forming a pattern having a first width includes a first line, a second line, and at least one bridge line. The first line may be extended in a first direction. The first line has a second width narrower than the first width. The second line may be extended parallel to and spaced apart from the first line. The second line is formed having the second width. The bridge line may be connected between the first line and the second line.
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