PLASMA LIGHT DETECTION SYSTEM INCLUDING A SCINTILLATING WINDOW
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United States of America
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Issued Date -
Mar 13, 2025
app pub date -
Apr 11, 2024
filing date -
Apr 11, 2024
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Abstract
A substrate processing apparatus includes a process chamber providing a process space, a stage located in the process chamber and configured to support a substrate, a window coupled to a side of the process chamber, and a scintillator layer coupled to one side surface of the window. The scintillator layer covers a portion of the one side surface of the window which is less than the full window surface. A second surface corresponding to another portion of the one side surface of the window is exposed. Light emitted by a plasma in the process space passes through the window and is collected by an optical system and analyzed. Ultraviolet light passing through the scintillator is converted to longer wavelength, generally visible, light. Comparing the light passing through the bare window with the light passing through the scintillator layer enables analysis of the plasma.
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