HYBRID DEPOSITING APPARATUS FOR GALLIUM OXIDE AND METHOD FOR HYBRID DEPOSITING USING SAME
Number of patents in Portfolio can not be more than 2000
United States of America
Stats
-
N/A
Issued Date -
Mar 13, 2025
app pub date -
Nov 21, 2024
filing date -
Nov 21, 2024
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
The present disclosure relates to a hybrid deposition apparatus for gallium oxide, and a hybrid deposition apparatus for gallium oxide according to a disclosed embodiment of the present disclosure includes a gas supply assembly for supplying a source gas, a reaction gas, and a purge gas, a liquid supply assembly for supplying at least a portion of the source gas, and a chamber unit which is connected to the gas supply assembly and the liquid supply assembly and has a substrate disposed therein.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully