CHEMICAL MECHANICAL POLISHING PROCESS USING STEAM FOR POLISHING FLUID DELIVERY AND AN APPARATUS FOR IMPLEMENTING THE SAME

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United States of America

APP PUB NO 20250083282A1
SERIAL NO

18462830

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Abstract

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A chemical mechanical polishing method includes providing a liquid-gas polishing fluid mixture to a polishing pad, and polishing a surface of a work piece on the polishing pad using the liquid-gas polishing fluid mixture.

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Patent Owner(s)

Patent OwnerAddress
SANDISK TECHNOLOGIES INC951 SANDISK DRIVE LEGAL DEP MILPITAS CA 95035

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KISHIMOTO, Koji Yokkaichi, JP 29 505
YAMADA, Yohei Yokkaichi, JP 75 199
YAMAGUCHI, Minoru Yokkaichi, JP 72 598

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