Light Source Using Pre-Ionization

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250081319A1
SERIAL NO

18586458

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An EUV light source includes a chamber that defines a plasma confinement region. A magnetic core is positioned around the chamber and is configured to generate a plasma in the plasma generation region so that the plasma converges in the plasma confinement region. A power delivery section is positioned around the magnetic core. A power supply includes a charging circuit, a pre-ionization circuit, and a solid state switching circuit having an output coupled to the magnetic core. The power supply is configured to isolate the charging circuit from the power delivery section and to generate a pre-ionization pulse through inductive coupling that causes ionization of gas in the plasma generation region. The solid state switching circuit is configured to discharge a capacitance through inductive coupling to form a plasma in the plasma generation region.

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Patent Owner(s)

Patent OwnerAddress
HAMAMATSU PHOTONICS K K1126-1 ICHINO-CHO HIGASHI-KU HAMAMATSU-SHI SHIZUOKA 435-8558
ENERGETIQ TECHNOLOGY INC205 LOWELL STREET WILMINGTON MA 01887

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Arcaro, Daniel J Medford, US 3 0
Niell,, III Frederick Marvin Tampa, US 6 2
Reisman, David B Albuquerque, US 3 0
Roderick, Michael J Everett, US 7 5
Smith, Donald K Newton, US 68 2674

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