WAFER SUPPORT TABLE AND RF ROD
Number of patents in Portfolio can not be more than 2000
United States of America
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Issued Date -
Mar 6, 2025
app pub date -
Oct 31, 2024
filing date -
Oct 31, 2024
priority date (Note) -
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Abstract
A wafer support table includes a ceramic base having a wafer placement surface and including an RF electrode and a heater electrode embedded; a hole extending from a surface of the ceramic base opposite the wafer placement surface toward the RF electrode; and an RF rod having a top end joined to the RF electrode exposed to a bottom of the hole or joined to a conductive member connected to the RF electrode; wherein the RF rod is a hybrid rod including a first rod member that is made of Ni and constitutes a portion of the RF rod from the top end to a predetermined position and a second rod member that is joined to the first rod member and constitutes a portion of the RF rod from the predetermined position to the base end, and the second rod member is a non-magnetic core member with an oxidation-resistant film.
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