SUBSTRATE PROCESSING APPARATUS, ROTATION STATE DETECTION METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
Number of patents in Portfolio can not be more than 2000
United States of America
Stats
-
N/A
Issued Date -
Mar 6, 2025
app pub date -
Aug 29, 2024
filing date -
Aug 29, 2024
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
Provided is a technique capable of obtaining a desired processing quality for each of a plurality of substrates even when the plurality of substrates are processed while being rotated. There is provided a technique that includes: a process chamber in which a plurality of substrates are processed; a gas supplier configured to be capable of supplying a gas to the process chamber; a substrate support provided in the process chamber so as to be rotatable and configured to be capable of supporting the plurality of substrates in a circumferential arrangement; and a detector configured to detect a rotation state of the substrate support.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully