DEPOSITION OF ORGANIC MATERIAL

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250079161A1
SERIAL NO

18816095

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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In one aspect, a method, system and apparatus are disclosed for selectively depositing a layer of organic material on a substrate including a first surface and a second surface by a cyclic deposition process, the process includes providing a substrate in a reaction chamber, providing a first vapor-phase precursor in the reaction chamber, and providing a second vapor-phase precursor in the reaction chamber, where the first and second vapor-phase precursors form the organic material selectively on the first surface relative to the second surface, and where the first vapor-phase precursor includes a diamine or triamine compound.

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Patent Owner(s)

Patent OwnerAddress
ASM IP HOLDING B VVERSTERKERSTRAAT 8 ALMERE 1322 AP

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chandrasekaran, Anirudhan Scottsdale, US 13 4
Kachel, Krzysztof Kamil Chandler, US 13 2468
Vianna, Adam Phoenix, US 3 0
Zhang, Yi Cheng Scottsdale, US 4 4

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