ION PROBE WITH COUPLING TO PLASMA
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United States of America
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Issued Date -
Mar 6, 2025
app pub date -
Aug 2, 2024
filing date -
Aug 2, 2024
priority date (Note) -
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status (Latency Note)
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Abstract
Embodiments include a plasma processing apparatus including a chamber with an inner chamber wall. A workpiece support is within the inner chamber wall, the workpiece support for supporting a workpiece in a processing region of the chamber. An ion probe extends through the chamber and inner chamber wall and into a plasma region above the workpiece.
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