EXTREME ULTRAVIOLET (EUV) SOURCE AND A SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
Number of patents in Portfolio can not be more than 2000
United States of America
Stats
-
N/A
Issued Date -
Mar 6, 2025
app pub date -
Mar 5, 2024
filing date -
Mar 5, 2024
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
An extreme ultraviolet (EUV) source includes a housing providing a light-collecting space having a cone shape becoming narrower in a first direction, an EUV collector disposed at a first end portion of the housing and including a reflection surface disposed toward the light-collecting space, and an exhaust pipe coupled to the housing and providing an exhaust flow path connected to the light-collecting space, wherein the exhaust pipe extends from the housing and forms an acute angle with the housing toward a second end portion of the housing.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully